PVD Materials

Sputtering Targets, Evaporation Material, Angstrom Sciences

PVD or Physical Vapor Deposition Materials comprise a range of materials that can be used to create thin film coatings. Angstrom Sciences offers a comprehensive selection of high-purity vacuum deposition materials including:

Aluminum

Aluminum Copper

Aluminum Copper Tungsten

Aluminum Nitride

Aluminum Oxide

Aluminum Silicon

Antimony

Barium

Barium Ferrite

Barium Fluoride

Barium Strontium Titanate

Barium Titanate

Barium Oxide

Beryllium

Bismuth

Bismuth Lanthanum Titanium

Bismuth Strontium Calcium

Bismuth Strontium Titanate

Bismuth Titanium Oxide

Bismuth Trioxide

Boron

Boron Carbide

Boron Nitride

Cadmium Fluoride

Cadmium Oxide

Cadmium Selenide

Cadmium Sulfide

Cadmium Telluride

Calcium Fluoride

Calcium Oxide

Calcium Silicate

Calcium Titanate

Carbon (Graphite)

Carbon Steel

Cerium

Cerium Oxide

Chromium

Chromium Boride

Chromium Oxide

Chromium Silicide

Cobalt

Cobalt Chromium

Cobalt Oxide

Cobalt Silicide

Cobalt Zirconium

Copper

 

Copper Sulfide

Copper Oxide

Dysprosium

Erbium

Europium

Gallium

Gallium Arsenide

Gallium Oxide

Gadolinium

Germanium

Germanium Nitride

Germanium Oxide

Gold

Gold Germanium

Gold Palladium

Gold Tin

Gold Zinc

Hafnium

Hafnium Carbide

Hafnium Nitride

Hafnium Oxide

Holmium

Inconel

Indium

Indium Oxide

Indium Tin Oxide

Iridium

Iron

Iron Oxide

Lead

Lanthanum

Lanthanum Aluminate

Lanthanum Boride

Lanthanum Oxide

Lanthanum Strontium Cobalt Oxide

Lanthanum Manganese Oxide

Lead Oxide

Lead Titanate

Lead Zirconium Titanate Oxide

Lithium

Lithium Carbonate

Lithium Cobalt Oxide

Lithium Niobate

 

 

 

Lithium Phosphate

Lithium Tantalate

Magnesium

Magnesium Fluoride

Magnesium Monoxide

Magnesium Oxide

Manganese

Molybdenum                          

Molybdenum Disulfide            

Molybdenum Oxide

Molybdenum Selenide

Molybdenum Silicide

Molybdenum Sulfide

Neodymium                            

Neodymium Gallium Oxide

Neodymium Iron Boride

Nickel

Nickel Chromium

Nickel Cobalt

Nickel Oxide

Nickel Silicide

Nickel Vanadium

Niobium

Niobium Oxide

Palladium

Platinum

Praseodymium

Pryolytic Boron Nitride

Rhenium

Rhodium

Ruthenium

Samarium

Samarium Cobalt

Scandium

Scandium Oxide

Selenium

Silicon

Silicon Carbide

Silicon Dioxide

Silicon Monoxide

Silicon Nitride

Silver

Silver Oxide

Strontium Bismuth Niobium Oxide

 

Strontium Bismuth Tantalum Niobium

Strontium-doped Lanthanum

Strontium Oxide

Strontium Titanate

Tantalum

Tantalum Carbide

Tantalum Nitride

Tantalum Oxide

Tantalum Silicide

Tantalum Sulfide

Tellurium

Terbium

Terbium Iron

Thallium

Thallium Oxide

Thorium Fluoride

Thorium Oxide

Tin

Tin Oxide

Titanium

Titanium Boride

Titanium Carbide

Titanium Nitride

Titanium Oxide

Titanium Silicide

Titanium Sulfide

Tungsten

Tungsten Silicide

Tungsten Sulfide

Tungsten Titanium

Vanadium

Vanadium Pent Oxide

Yttrium

Yttrium Barium Copper Oxide

Yttrium Oxide

Zinc

Zinc Oxide                             

Zinc Selenide

Zinc Sulfide

Zirconium                                               

Zirconium Nitride                    

Zirconium Oxide

Zirconium Silicate

Zirconium Oxide Yttrium Oxide

 

 

Click Here for an Expanded List of PVD Materials

 

There are three factors that influence the quality and functionality of a film deposited by Physical Vapor Deposition (PVD): the quality and performance  of the deposition source, the properties and structure of the deposition materials, and the intrinsic performance and layout of the deposition system and its’ associated peripherals.  Angsstrom Sciences has the abilities and know how to control two of these three main factors.

From sputtering targets of any size to materials used for thermal / e-beam evaporation, Angstrom Sciences has the ability to suggest and direct the most suitable materials for any application.  Not all materials are equivalent in these processes as the chemical composition of the source material is only the starting point of a robust, application-specific process.  Impurity levels, grain size, crystallographic structure/texture are but a few of the considerations that go into uniquely tailoring the structure of a suitable deposition structure.  We draw from variety of specialized processing techniques such as Hot Pressing, Cold Pressing, Hot Isostatic Pressing (HIP), Cold Isostatic Pressing (CIP), Vacuum Induction Melting (VIM)  and Vacuum Arc Casting to produce homogenous, fine-grained, high-density materials that conform to the strictest application standards.  All of our PVD materials are provided with a NIST traceable composition and impurity analysis.  Click here for a list of materials we have delivered in the past; recognizing that this list only scratches the surface of the compositions that we can offer.

At Angstrom Sciences no order is too small or too big.  There are no minimum lot-size requirements for custom compositions and our extraordinary focus on customer service is the envy of the industry.  We routinely provide backing plates (copper, molybdenum, copper-chromium) for planar, circular and cylindrical sputtering targets, conductive pastes and thermal transfer foil for sputter target cooling, and also offer bonding services as part of our comprehensive range of services to the PVD community.

 

For more information about PVD Materials or how Angstrom Sciences can help your business call 412-469-8466 or contact us online.