HiPIMS – High Power Impulse Magnetron Sputtering
High Power Impulse Magnetron Sputtering or HiPIMS is a relatively recent advancement in magnetron sputtering technology. This technique uses a specialized power supply that develops very high energy, short duration pulses to generate a high-density plasma discharge. This ionizes a large percentage of the sputtered atoms as opposed to traditional magnetron sputtering where the coating material remains mostly neutral. The ionized flux can then be guided for increased control of the coating properties.
Description
In HiPIMS, a high peak voltage and high current density is applied to the sputtering target in pulses at relatively short pulse lengths with equally low frequencies and long periods of time between cycles. The pulse durations are typically in the range of 50 to 200 microseconds with frequencies in the 500 hertz range while the time between cycles can be as little as several hundredths of a second. This allows for a low duty cycle, in the 10% range which minimizes heating while maintaining process stability.
There are several advantages to using HiPIMS technology to change the morphology and structure of the resultant films. Properties including density, hardness, surface topography, refractive index, and adhesion can all be modified and enhanced through the Hipims process.
Angstrom Sciences has developed a series of sputtering cathodes capable of sustaining these extreme power densities for continuous long running production applications. Along with our patented turbulent target cooling, Angstrom Sciences’ High Power Impulse Magnetron Sputtering Cathodes incorporate additional cooling channels in the anode body and mounting flanges to maintain optimum cooling during process operation.
Other features include passive and active magnet arrays that keep the field intensity at the target surface consistent through target life which is critical in the HIPIMS process for both the reduction of arcing and optimum ionization of the sputtered material.
These features along with solid anode construction allow for consistent repeatable performance in demanding applications like HiPIMS or any high-power long run-time applications.
Angstrom Sciences HiPIMS magnetrons are available in a wide range of circular, linear and cylindrical designs.
We also offer Plasus EMICON FS System which is a fast spectroscopic and electrical monitor system that enables continuous pulse-resolved process monitoring and control in pulsed plasma applications like HiPIMS or Pulsed DC Sputtering. With its unprecedented time resolution, the EMICON FS system sets the new worldwide unique standard in industrial process control. Click here for more information on the EMICON FS.
For more information about High Power Impulse Magnetron Sputtering, call +1-412-469-8466 or contact us online.
